| 摘要 |
PROBLEM TO BE SOLVED: To reduce the scattering of a resonant frequency of a surface acoustic wave device formed on a piezoelectric substrate. SOLUTION: A manufacturing method of a surface acoustic wave device includes the following steps: a film forming process for forming a conductive film on the surface of a piezoelectric substrate (step 12); a resist film forming process for forming a resist film on the conductive film (step 14); a resist film patterning process which exposes a pattern prepared in a photo mask to the resist film by reducing and projecting and develops it (step 16); an electrode forming process for etching the conductive film with a patterned resist film as a mask (step 18); a frequency measurement process for measuring a resonant frequency of the surface acoustic wave device formed on the piezoelectric substrate (step 24); a voltage operation process for obtaining an anodic oxidation voltage by operating the amount of the anodic oxidation of the electrode from the measured resonant frequency and a predetermined target resonant frequency (step 26); and an anodic oxidation process for detecting the end of the oxidation reaction of the electrode and finishing the anodic oxidation (step 28). COPYRIGHT: (C)2006,JPO&NCIPI |
