| 摘要 |
PROBLEM TO BE SOLVED: To provide a mapping type electron microscope composed by relaxing restriction of a condition of a projection electron optical system to design of an illumination electron optical system to increase the degree of freedom of design of the illumination electron optical system. SOLUTION: Generated electrons 6b (main light ray) emitted in parallel with an optical axis from a sample 5 are focused by a cathode lens and intersect with the optical axis 3 at one point. The point becomes a first crossover. The generated electrons 6b are set parallel with the optical axis by the cathode lens 74a and focused at the position of an electromagnetic prism 2, enters a zoom lens 8a through a stigmetor 7, and focused again to intersect with the optical axis 3 at one point. The position becomes a second crossover. An aperture stop 11 is formed at the second crossover position. Thereby, the need to form an aperture stop at the first crossover position is obviated, whereby the design of the illumination electro-optical system is facilitated. COPYRIGHT: (C)2006,JPO&NCIPI
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