LITHOGRAPHIC PRINTING PLATES WITH HIGH PRINT RUN STABILITY

摘要

Radiation-sensitive element comprising (a) an optionally pretreated substrate and (b) a radiation-sensitive coating consisting of a composition comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free­radical polymerization, (ii) at least one radiation-sensitive initiator or initiator system for free-radical polymerization absorbing radiation selected from the wavelength range of 300 to 1,200 nm; and (iii) at least one silsesquioxane comprising at least one substituent with at least one ethylenically unsaturated group each; applied onto the substrate.