CHARGED PARTICLE BEAM EXPOSURE APPARATUS, METHOD FOR EXPOSING CHARGED BEAM AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a charged particle exposure apparatus capable of obtaining desired pattern sizing accuracy. SOLUTION: The direction of blanking is controlled in the charged particle exposure apparatus for exposing a substrate through the use of a blanking means which repeats shielding and exposing charged particle beams to the substrate to be exposed. The direction of blanking is adjusted to be the direction vertical to the raster scan direction or the direction in which a beam diameter of the charged particle beam on the substrate is the shortest. COPYRIGHT: (C)2006,JPO&NCIPI