| 摘要 |
<p>A magnetic levitation lithography machine having a low spring stiffness to minimize disturbances of the first structure and which is capable of dynamically controlling the first structure in one or more degrees of freedom. The machine includes a radiation source, a patterning element configured to define a pattern, a projection element, the projection element configured to project the pattern onto a substrate when radiation from the radiation source is projected through the projection element; and a substrate take configured to support the substrate. The substrate take includes a second structure, a fine stage, and a magnetic support configured to support the fine stage adjacent the second structure. The magnetic support includes a first magnet element, coupled to the fine stage, having a first magnet polarization, a second magnet element, coupled to the course stage, having a second magnet polarization, the first magnet element being separated from the second magnet element by a gap, and an adjustment mechanism configured to adjust the magnetic force used to support the fine stage by varying the gap between the first magnet element and the second magnet element.</p> |
