发明名称 METHOD FOR MANUFACTURING DIFFRACTION GRATING
摘要 PROBLEM TO BE SOLVED: To obtain a buried type diffraction grating having excellent surface smoothness by a method having a reduced number of processes and reduced restriction on manufacturing conditions. SOLUTION: 1. The method for manufacturing the buried type diffraction grating has a (1) a process of forming a resist layer on a substrate surface, (2) a process of forming a diffraction grating pattern prototype in the resist layer, (3) a process of forming groove parts coping with the diffraction grating pattern prototype on the surface layer part of the substrate, (4) a process of burying the thin film of a material different in refractive index from the substrate in the groove parts formed on the surface layer of the substrate, and (5) a process of forming the diffraction grating pattern composed of the thin film of the material different in the refractive index from the substrate on the surface layer part of the substrate by removing the resist layer. 2. The method for manufacturing the buried type diffraction grating further has (6) a process of forming the diffraction grating pattern protective layer on the substrate surface. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006010778(A) 申请公布日期 2006.01.12
申请号 JP20040184088 申请日期 2004.06.22
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 KANETAKA KENJI;NISHII JUNJI
分类号 G02B5/18 主分类号 G02B5/18
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