METHOD AND APPARATUS FOR RECOVERING CHEMICAL FROM SEMICONDUCTOR WAFER

摘要

An apparatus and a method are provided for accurately analyzing and evaluating a degree of contamination on a chamfered part without mixing impurities from parts other than the chamfered part into a chemical. At a position which can be brought into contact with a boundary region between the chamfered part and a front plane flat part of a semiconductor wafer in the front plane flat part, a radius direction position of the chemical (a distance between a chemical center and a wafer center) is determined, scanning is performed in a circumference direction, and the chemical including impurities is recovered. Then, at a position which can be brought into contact with the both chamfered part of the semiconductor wafer and the boundary region, a radius direction position of the chemical is determined, scanning is performed in the circumference direction and the chemical including impurities is recovered. A liquid drop holder is, for instance, relatively rotated in the circumference direction from a desired start point on the circumference of the semiconductor wafer to an end point.