| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
A lithographic projection apparatus is disclosed in which a liquid supply system (LSS) provides an immersion liquid between a final element of the projection system (PL) and the substrate (W). An active drying station (ADS) is provided for actively removing immersion liquid from the substrate (W) or other objects after immersion of the substrate. <IMAGE> |
| 申请公布号 |
SG117565(A1) |
申请公布日期 |
2005.12.29 |
| 申请号 |
SG20050002893 |
申请日期 |
2005.05.13 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BOB STREEFKERK;SJOERD NICOLAAS LAMBERTUS DONDERS;ERIK ROELOF LOOPSTRA;JOHANNES CATHARINUS HUBERTUS MULKENS |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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