SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF

摘要

A sputtering target having been prepared by the butt joining of metal sheets having the same quality, characterized in that an intermetallic compound in a joined portion has an average particle 60 to 130 % that of the intermettalic compound in a non-jointed portion. In the sputtering target, the particle diameter of an intermetallic compound in a joined portion is similar to that of the intermetallic compound in a non-joined portion.