发明名称 |
METHOD OF FORMING GRAFT PATTERN, GRAFT PATTERN MATERIAL, METHOD OF LITHOGRAPHY, METHOD OF FORMING CONDUCTIVE PATTERN, CONDUCTIVE PATTERN, PROCESS FOR PRODUCING COLOR FILTER, COLOR FILTER AND PROCESS FOR PRODUCING MICROLENS |
摘要 |
<p>A method of forming a graft pattern, in which a high-resolution pattern formation can be realized with the use of a general-purpose exposure machine and in which oil repellent and water repellent regions can be formed with high efficiency; a method of lithography, in which the oil repellent and water repellent graft pattern obtained by the above method is used as an etching stopper; and using the graft pattern formed by the above graft pattern forming method, a method of forming a conductive pattern, process for producing a color filter and process for producing a microlens. There is provided a method of forming a graft pattern, characterized in that graft polymer production regions and nonproduction regions are formed by disposing on a substrate surface a compound having not only a photopolymerization initiation moiety capable of initiating radical polymerization through photo-splitting but also a substrate-binding moiety in a pattern format, bringing it into contact with a radical-polymerizable compound having an oil repellent and water repellent functional group and thereafter conducting whole-surface exposure, or alternatively by causing a compound having not only a photopolymerization initiation moiety capable of initiating radical polymerization through photo-splitting but also a substrate-binding moiety to bind to a substrate, bringing it into contact with a radical-polymerizable compound having an oil repellent and water repellent functional group and thereafter conducting exposure in a pattern format.</p> |
申请公布号 |
WO2005116763(A1) |
申请公布日期 |
2005.12.08 |
申请号 |
WO2005JP09920 |
申请日期 |
2005.05.31 |
申请人 |
FUJI PHOTO FILM CO., LTD.;KAWAMURA, KOICHI |
发明人 |
KAWAMURA, KOICHI |
分类号 |
B81C1/00;B82B3/00;G02B3/00;G02B5/20;G03F7/004;G03F7/027;G03F7/029;G03F7/26;H01L21/027;H05K3/06;H05K3/10;(IPC1-7):G03F7/004 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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