| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a thin film using a compound which can be easily converted into a material capable of showing high heat resistance by firing, and also to provide a method for producing a thin film using a silsesquioxane-containing compound which is soluble in a solvent and can easily give a high heat resistant transparent film after film formation and firing. SOLUTION: In the method of producing a thin film, a solution of a silsesquioxane-containing compound wherein at least two cage-like silsesquioxanes are bound through a binding group is coated on a substrate and then the bound group is subjected to thermal decomposition. COPYRIGHT: (C)2006,JPO&NCIPI |
