发明名称 CLEANING METHOD AND CLEANING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method and a cleaning device capable of injecting steam to a substrate and removing a particulate, an organic substance, metal powder and the like on the substrate. SOLUTION: A cleaning device for cleaning the front surface of a substrate 37 comprises a container 1 for burning hydrogen and oxygen and producing steam and a steam supply pipe 29 which is connected with the container 1 and carries out cleaning by continuously or intermittently injecting steam to the front surface of the substrate 37. Hydrogen and oxygen are burned in the container 1. Steam after the burning is continuously or intermittently produced. Steam is injected to the front surface of the substrate 37. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005327992(A) 申请公布日期 2005.11.24
申请号 JP20040146638 申请日期 2004.05.17
申请人 OMEGA SEMICON DENSHI KK 发明人 ONODA HAJIME;WATANABE KAZUTOSHI;HATTORI KEN
分类号 B08B3/02;H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B3/02
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