发明名称 REFLECTION TYPE PROJECTION OPTICAL SYSTEM AND EXPOSURE DEVICE HAVING THE REFLECTION TYPE PROJECTION OPTICAL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a reflection type projection optical system in which good reflection characteristics are provided even for X-rays, an increase in the sizes of reflection mirrors is suppressed and aberration correction is properly conducted. <P>SOLUTION: The reflection type projection optical system is provided with eight reflection mirrors and a reduced size image of a first surface (4) is formed on a second surface (7). The following reflection mirrors are provided for the optical system in the order of incident light beams from the first surface side, i.e., a concave first reflection mirror M1, a second reflection mirror M2 which has a convex surface and an aperture diaphragm AS, a concave third reflection mirror M3, a concave fourth reflection mirror M4, a concave fifth reflection mirror M5, a sixth reflection mirror M6, a convex seventh reflection mirror M7 and a concave eighth reflection mirror M8. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005315918(A) 申请公布日期 2005.11.10
申请号 JP20040130625 申请日期 2004.04.27
申请人 NIKON CORP 发明人 TAKAHASHI TOMOWAKI
分类号 G21K1/06;G02B13/18;G02B13/24;G02B17/00;G03F7/20;G21K5/02;H01L21/027 主分类号 G21K1/06
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