| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate which scarcely results in cleaning unevenness in a cleaning step and also damage in a substrate layer of an alignment film, a method for manufacturing a substrate including such a cleaning method, and to prevent a device for cleaning a substrate. SOLUTION: Disclosed is the method for cleaning a substrate with an alignment film, the method for manufacturing a substrate including such a cleaning method, or a device for cleaning such a substrate, and steps (A) to (D) described below or a device for performing them is included. The steps comprise: (A) forming the alignment film on the top surface of the substrate; (B) rubbing the top surface of the alignment film; (C) bringing the substrate with the alignment into contact with the water in a water tank containing the water by a prescribed amount on the whole; and (D) subjecting the substrate with the alignment film to shower and/or ultrasonic wave washing processing. COPYRIGHT: (C)2006,JPO&NCIPI
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