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发明名称
Grabenisolierstruktur und Verfahren zu ihrer Herstellung
摘要
申请公布号
DE19856805(B4)
申请公布日期
2005.11.03
申请号
DE19981056805
申请日期
1998.12.09
申请人
LG SEMICON CO., LTD.
发明人
RHA, KWAN GOO
分类号
H01L21/762;H01L21/764;(IPC1-7):H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
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