| 发明名称 |
FLUOROPOLYMER AND RESIST COMPOSITION |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photolithographic resist composition using an ultraviolet radiation of ≤250 nm and a polymer for the composition. <P>SOLUTION: The fluoropolymer (A) has a unit derived from cyclization polymerization of at least one fluorine-containing diene chosen from a fluorine-containing diene of formula (1): CF<SB>2</SB>=CFCF<SB>2</SB>-C(CF<SB>3</SB>)(OR<SP>1</SP>)-CH<SB>2</SB>CH=CH<SB>2</SB>and a fluorine-containing diene of formula (2):CF<SB>2</SB>=CFCH<SB>2</SB>-CH((CH<SB>2</SB>)<SB>n</SB>C(CF<SB>3</SB>)<SB>2</SB>(OR<SP>1</SP>))-CH<SB>2</SB>CH=CH<SB>2</SB>and a unit derived from cyclization polymerization of a fluorine-containing diene of formula (3): CF<SB>2</SB>=CFCH<SB>2</SB>-CH(COOR<SP>2</SP>)-CH<SB>2</SB>CH=CH<SB>2</SB>(wherein R<SP>1</SP>is a hydrogen atom, a blocked group or the like; R<SP>2</SP>is a hydrocarbon group; and n is 0 or 1). The resist composition contains the fluoropolymer (A). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2005298707(A) |
申请公布日期 |
2005.10.27 |
| 申请号 |
JP20040118534 |
申请日期 |
2004.04.14 |
| 申请人 |
ASAHI GLASS CO LTD |
发明人 |
TAKEBE YOKO;EDA MASATAKA;YOKOKOJI OSAMU |
| 分类号 |
G03F7/033;C08F14/18;C08F18/20;C08F214/18;C08F222/18;C08F236/20;G03F7/039;H01L21/027 |
主分类号 |
G03F7/033 |
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