发明名称 Multi-layered unit including electrode and dielectric layer
摘要 A multi-layered unit according to the present invention includes a support substrate formed of fused quartz, an electrode layer formed on the support substrate and formed of a conductive material, a buffer layer formed on the electrode layer and formed of a dielectric material containing a bismuth layer structured compound having a composition represented by Bi<SUB>4</SUB>Ti<SUB>3</SUB>O<SUB>12 </SUB>and having an excellent orientation characteristic so that the bismuth layer structured compound is oriented in the c axis direction, and a dielectric layer formed on the buffer layer and formed of a dielectric material containing a bismuth layer structured compound having a composition represented by SrBi<SUB>4</SUB>Ti<SUB>4</SUB>O<SUB>15 </SUB>and having an excellent orientation characteristic so that the bismuth layer structured compound is oriented in the c axis direction. Since the thus constituted multi-layered unit includes the dielectric layer containing the bismuth layer structured compound oriented in the c axis direction, in the case of, for example, providing an upper electrode on the dielectric layer to form a thin film capacitor and applying a voltage between the electrode layer and the upper electrode, the direction of the electric field substantially coincides with the c axis of the bismuth layer structured compound contained in the dielectric layer. As a result, since the ferroelectric property of the bismuth layer structured compound contained in the dielectric layer can be suppressed and the paraelectric property thereof can be fully exhibited, it is possible to fabricate a thin film capacitor having a small size, large capacitance and an excellent dielectric characteristic.
申请公布号 US6958900(B2) 申请公布日期 2005.10.25
申请号 US20030375923 申请日期 2003.02.26
申请人 TDK CORPORATION 发明人 SAKASHITA YUKIO
分类号 C30B25/18;C30B29/32;H01L21/02;H01L21/316;(IPC1-7):H01G4/228 主分类号 C30B25/18
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