| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To enhance the measurement precision of a measuring apparatus which uses attenuated total reflection. <P>SOLUTION: In the measuring apparatus which brings a light beam 13 to enter an interface 10b between a dielectric block 10 and a metallic layer 12 of a chip to be measured 9 and measures a dark-line position in the light beam 13 reflected by the interface 10b, the reflected light beam 13 is received by a light detection means 17 having a plurality of light receiving elements arranged in a two-dimensional form, and an abnormal pixel column is extracted in an extracting means 19 from light detection signals output by the light receiving elements of the light detection means 17, and the dark-line position in the light beam 13 reflected by the interface 10b is detected from output signals of light receiving elements in pixel columns other than the abnormal pixel column. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
