| 摘要 |
A method and system for chrome cut-out regions on a reticle is described. The method includes determining a location of one or more regions on a reticle that come in contact with a reticle handling, storage, or support surface and generating a pattern to be written on the reticle, where the pattern includes one or more cut-out regions that correspond to the one or more regions that come in contact with the reticle handling, storage, or support surface. The pattern may then be written on a reticle blank and developed and etched to remove the reticle surface chrome from the one or more regions that have been determined to come in contact with the reticle handling, storage, or support surface.
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