CLEANING AGENT OF WASTE GAS CONTAINING HALOGEN COMPOUNDS FROM SEMICONDUCTOR ETCHING PROCESS AND CLEANING METHOD USING THE SAME,申请号KR19990021122-传众专利搜索

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发明名称	CLEANING AGENT OF WASTE GAS CONTAINING HALOGEN COMPOUNDS FROM SEMICONDUCTOR ETCHING PROCESS AND CLEANING METHOD USING THE SAME
摘要
申请公布号	KR100520450(B1)	申请公布日期	2005.10.12
申请号	KR19990021122	申请日期	1999.06.08
申请人		发明人
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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