发明名称 Diamond single crystal substrate
摘要 A diamond single crystal substrate obtained by a vapor-phase growth method, wherein the diamond intrinsic Raman shift of the diamond single crystal substrate surface measured by microscopic Raman spectroscopy with a focused beam spot diameter of excitation light of 2 mum is deviated by +0.5 cm<SUP>-1 </SUP>or more to +3.0 cm<SUP>-1 </SUP>or less from the standard Raman shift quantity of strain-free diamond, in a region (region A) which is more than 0% to not more than 25% of the surface, and is deviated by -1.0 cm<SUP>-1 </SUP>or more to less than +0.5 cm<SUP>-1 </SUP>from the standard Raman shift quantity of strain-free diamond, in a region (region B) of the surface other than the region A. The diamond single crystal substrate can be obtained with a large size and high-quality without cracking and is suitable for semiconductor materials, electronic components, and optical components or the like.
申请公布号 US2005211159(A1) 申请公布日期 2005.09.29
申请号 US20050055973 申请日期 2005.02.14
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 MEGURO KIICHI;YAMAMOTO YOSHIYUKI;IMAI TAKAHIRO
分类号 C30B25/18;C30B29/04;(IPC1-7):C30B7/00;C30B21/02;C30B28/06;C30B23/00;C30B25/00;C30B28/12;C30B28/14 主分类号 C30B25/18
代理机构 代理人
主权项
地址