发明名称 |
Diamond single crystal substrate |
摘要 |
A diamond single crystal substrate obtained by a vapor-phase growth method, wherein the diamond intrinsic Raman shift of the diamond single crystal substrate surface measured by microscopic Raman spectroscopy with a focused beam spot diameter of excitation light of 2 mum is deviated by +0.5 cm<SUP>-1 </SUP>or more to +3.0 cm<SUP>-1 </SUP>or less from the standard Raman shift quantity of strain-free diamond, in a region (region A) which is more than 0% to not more than 25% of the surface, and is deviated by -1.0 cm<SUP>-1 </SUP>or more to less than +0.5 cm<SUP>-1 </SUP>from the standard Raman shift quantity of strain-free diamond, in a region (region B) of the surface other than the region A. The diamond single crystal substrate can be obtained with a large size and high-quality without cracking and is suitable for semiconductor materials, electronic components, and optical components or the like.
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申请公布号 |
US2005211159(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20050055973 |
申请日期 |
2005.02.14 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
MEGURO KIICHI;YAMAMOTO YOSHIYUKI;IMAI TAKAHIRO |
分类号 |
C30B25/18;C30B29/04;(IPC1-7):C30B7/00;C30B21/02;C30B28/06;C30B23/00;C30B25/00;C30B28/12;C30B28/14 |
主分类号 |
C30B25/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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