发明名称 |
Short edge smoothing for enhanced scatter bar placement |
摘要 |
An edge-smoothing process identifies a target edge fragment among a number of edge fragments that form a feature in a photolithographic design. Each of the edge fragments has a length and a classification. The length of the target edge fragment is less than a minimum scatter bar length. The target edge fragment is also classified so that it will receive a scatter bar, and the target edge fragment has a collinear edge fragment. The target edge fragment is smoothed in conjunction with the collinear edge fragment to increase the length of the target edge fragment.
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申请公布号 |
US2005208396(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20050040195 |
申请日期 |
2005.01.20 |
申请人 |
MENTOR GRAPHICS CORPORATION |
发明人 |
LIPPINCOTT GEORGE P. |
分类号 |
G03C5/00;G03F1/14;G06F17/50;(IPC1-7):G06F17/50 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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