发明名称 Adjustable threshold isolation transistor
摘要 An method and apparatus for high voltage control of isolation region transistors ( 320 ) in an integrated circuit. Isolation region transistors ( 320 ) are formed between active devices by selective implantation of channel stop implants ( 140 ). Isolation region transistors ( 320 ) are those areas with a conductor ( 130 ) over an isolation region ( 120 ) with no channel stop implant ( 140 ). This provides an isolation region transistor ( 320 ) with a lower threshold voltage than the areas with channel stop implant ( 140 ). The voltage threshold of the isolation region transistors 320 are adjustable to a range of voltages by varying the length of channel stop implant ( 140 ). The apparatus may be fabricated using conventional fabrication processes.
申请公布号 US6943072(B2) 申请公布日期 2005.09.13
申请号 US20030630598 申请日期 2003.07.29
申请人 ALTERA CORPORATION 发明人 SCHMIDT DOMINIK J.
分类号 H01L21/76;H01L21/762;H01L21/8234;H01L27/08;H01L29/78;(IPC1-7):H01L21/823 主分类号 H01L21/76
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