发明名称 |
Adjustable threshold isolation transistor |
摘要 |
An method and apparatus for high voltage control of isolation region transistors ( 320 ) in an integrated circuit. Isolation region transistors ( 320 ) are formed between active devices by selective implantation of channel stop implants ( 140 ). Isolation region transistors ( 320 ) are those areas with a conductor ( 130 ) over an isolation region ( 120 ) with no channel stop implant ( 140 ). This provides an isolation region transistor ( 320 ) with a lower threshold voltage than the areas with channel stop implant ( 140 ). The voltage threshold of the isolation region transistors 320 are adjustable to a range of voltages by varying the length of channel stop implant ( 140 ). The apparatus may be fabricated using conventional fabrication processes.
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申请公布号 |
US6943072(B2) |
申请公布日期 |
2005.09.13 |
申请号 |
US20030630598 |
申请日期 |
2003.07.29 |
申请人 |
ALTERA CORPORATION |
发明人 |
SCHMIDT DOMINIK J. |
分类号 |
H01L21/76;H01L21/762;H01L21/8234;H01L27/08;H01L29/78;(IPC1-7):H01L21/823 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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