发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which an occupying area is reduced. SOLUTION: The substrate processing apparatus is constituted by accumulating a unit for the substrate processing apparatus as a unit for constituting the substrate processing apparatus (cell). The apparatus has a treatment part for performing a predetermined treatment to the substrate, and a substrate conveyance means for performing delivery of the substrate at this treatment part on multiple steps. For example, since a cell 15A is accumulated on the cell 12, and a cell 15B is accumulated and constituted on a cell 13, the occupying area of the substrate processing apparatus can be reduced, and the footprint saving of the substrate processing apparatus can be performed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005243690(A) 申请公布日期 2005.09.08
申请号 JP20040047944 申请日期 2004.02.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SUGIMOTO KENJI;MATSUNAGA SANENOBU;SANADA MASAKAZU;YOSHIOKA KATSUJI;AOKI KAORU;YANO MORITAKA;YAMAMOTO SATOSHI;MIHASHI TAKESHI;NAGAO TAKASHI;KODAMA MITSUMASA
分类号 H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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