| 摘要 |
PROBLEM TO BE SOLVED: To provide a apparatus for cleaning substrate which can have high cleaning efficiency and make the cleaning time short. SOLUTION: The substrate cleaning apparatus comprises two cleaning brushes 20, 40. These brushes are driven independently of each other. The cleaning brush 20 performs approaching movement to the outside of an end edge of a substrate W, from a position A abutting against the rotary center O of the substrate W along its horizontal direction, upward movement from the end point position B of the approaching movement along its vertical direction, returning movement from an end point position C of the upward movement, along its horizontal direction to a position D directly above the rotary center O, and circulation movement as downward movement from an end point position D along its vertical direction downwardly to the start point position A of the approaching movement. The cleaning brush 40 also performs similar circulatory movements. At this time, the moving speed of the returning movement of the both cleaning brushes 20, 40 is set higher than the moving speed of the approaching movement, and the moving speed of the upward movement is set higher than the moving speed of the downward movement. COPYRIGHT: (C)2005,JPO&NCIPI
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