PLASMA MONITORING METHOD, PLASMA MONITORING DEVICE, AND PLASMA TREATMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To accurately measure electron density in plasma even under low-electron-density condition and high-pressure condition.

SOLUTION: A plasma electron density measurement device is provided with a vector system network analyzer 68 at its measurement part 54. Reflection coefficient expressed in complex number is measured by the network analyzer and frequency characteristics of its imaginary part is obtained. A resonance frequency at a point where the imaginary part of the complex reflecting coefficient zero-crosses at a measurement control part 74 is read, and a measurement value of the electron density is calculated from the resonance frequency.

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