发明名称 TRENCH INSULATED GATE FIELD EFFECT TRANSISTOR
摘要 The invention relates to a trench MOSFET with drain (8), drift (10) body (12) and source (14) regions. The drift region is doped to have a high concentration gradient. A field plate electrode (34) is provided adjacent to the drift region (10) and a gate electrode (32) next to the body region (12).
申请公布号 WO2005053032(A3) 申请公布日期 2005.08.25
申请号 WO2004IB52562 申请日期 2004.11.26
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V.;HUETING, RAYMOND, J., E.;HIJZEN, ERWIN, A. 发明人 HUETING, RAYMOND, J., E.;HIJZEN, ERWIN, A.
分类号 H01L29/06;H01L29/08;H01L29/40;H01L29/417;H01L29/423;H01L29/49;H01L29/78 主分类号 H01L29/06
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