Method for forming metal oxide layer by nitric acid oxidation

摘要

A method for forming a metal oxide layer by a nitric acid oxidation is disclosed. The method comprises steps of: a) providing a substrate, b) forming an ultra-thin silicon dioxide layer on the substrate, c) forming a metal layer on the silicon dioxide layer, d) oxidizing the metal layer into the metal oxide layer by the nitric acid oxidation, and e) annealing the metal oxide layer.