发明名称 |
Exposure apparatus and exposure method |
摘要 |
An exposure apparatus able to maintain reflectances of mirrors and transmittances of lenses and to maintain initial performance over a long period by using exposure light of a wavelength of the vacuum ultraviolet region to illuminate a mask and transfer images of patterns on the mask to a substrate, provided with a gas feed unit for supplying a light path space through which the exposure light passes with a gas mainly comprised of an inert gas or rare gas and introducing a predetermined concentration of hydrogen into the gas fed to at least part of the light path space.
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申请公布号 |
US2005157278(A1) |
申请公布日期 |
2005.07.21 |
申请号 |
US20040008631 |
申请日期 |
2004.12.10 |
申请人 |
NIKON CORPORATION |
发明人 |
OWA SOICHI;SHIRAISHI NAOMASA;AOKI TAKASHI |
分类号 |
G03F7/20;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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