发明名称 Substrate supporting means having wire and apparatus using the same
摘要 An apparatus includes: a process chamber for treating a substrate; a susceptor in the process chamber; a supporting frame over the susceptor; and at least one wire connected to the supporting frame.
申请公布号 US2005155557(A1) 申请公布日期 2005.07.21
申请号 US20050039505 申请日期 2005.01.19
申请人 HWANG CHUL-JOO;LEE SANG-DO 发明人 HWANG CHUL-JOO;LEE SANG-DO
分类号 C23C16/00;C23C16/458;G02F1/133;H01L21/677;H01L21/687;(IPC1-7):C23C16/00 主分类号 C23C16/00
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