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发明名称
ATOMIC LAYER DEPOSITION OF HIGH K METAL OXIDE
摘要
申请公布号
KR20050072087(A)
申请公布日期
2005.07.08
申请号
KR20057002823
申请日期
2005.02.18
申请人
AVIZA TECHNOLOGY, INC.;INTEGRATED PROCESS SYSTEMS LTD.
发明人
LEE, SANG IN;SENZAKI YOSHIHIDE;LEE, SANG KYOO
分类号
H01L27/04;C23C16/40;C23C16/44;C23C16/455;H01L;H01L21/20;H01L21/31;H01L21/314;H01L21/316;H01L21/822;H01L29/78;(IPC1-7):H01L21/20
主分类号
H01L27/04
代理机构
代理人
主权项
地址
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