METHOD FOR FABRICATING DUAL GATES,申请号KR20030101898-传众专利搜索

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发明名称	METHOD FOR FABRICATING DUAL GATES
摘要
申请公布号	KR20050071073(A)	申请公布日期	2005.07.07
申请号	KR20030101898	申请日期	2003.12.31
申请人	DONGBUANAM SEMICONDUCTOR INC.	发明人	LEE, DONG JOON
分类号	H01L21/8238;(IPC1-7):H01L21/823	主分类号	H01L21/8238
代理机构		代理人
主权项
地址

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