发明名称 OBJECTIVE AS A MICROLITHOGRAPHY PROJECTION OBJECTIVE WITH AT LEAST ONE LIQUID LENS
摘要 <p>The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.</p>
申请公布号 WO2005059654(A1) 申请公布日期 2005.06.30
申请号 WO2004EP14219 申请日期 2004.12.14
申请人 CARL ZEISS SMT AG;SHAFER, DAVID;BEDER, SUSANNE;SCHUSTER, KARL-HEINZ 发明人 SHAFER, DAVID;BEDER, SUSANNE;SCHUSTER, KARL-HEINZ
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
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