| 发明名称 |
LITHOGRAPHIC APPARATUS AND METHODS FOR USE THEREOF |
| 摘要 |
A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined. <IMAGE> |
| 申请公布号 |
KR20050063718(A) |
申请公布日期 |
2005.06.28 |
| 申请号 |
KR20040109577 |
申请日期 |
2004.12.21 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VANDIJK REMCO MARCEL;FLAGELLO DONIS GEORGE;KLAASSEN MICHEL FRANSOIS HUBERT;TREYGER LEONID;UITTERDIJK TAMMO |
| 分类号 |
G01M11/00;G01J1/00;G01J4/04;G03F1/14;G03F7/20;H01L21/027 |
主分类号 |
G01M11/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
