| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical component, which can precisely and continuously control the etching quantity or the film deposition quantity, without deteriorating the characteristic of the optical component, even in the film for the optical component having the refractive index equivalent to that of a substrate. SOLUTION: A reflective film 3 is prepared between the substrate 1 and the film 2 for the optical component. A monochromatic light is incident on the reflective film. The variation in the reflectance of the reflected light reflected by the interface between the film 2 for the optical component and the reflective film 3 and the variation in the etching thickness are used. COPYRIGHT: (C)2005,JPO&NCIPI
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