发明名称 Method of exposure error adjustment in photolithography for multiple products
摘要 A method of adjusting exposure error for multiple products is described. First, one Photo Feed Back System (PFBS) suited to host-product or miscellaneous product is chosen. Different standard points and compensation difference for host-product or miscellaneous product are provided. Then, the PFBS parameter is calculated as an exposure adjustment value. The standard point and compensation difference for miscellaneous product are dependent on host-product.
申请公布号 US2005122496(A1) 申请公布日期 2005.06.09
申请号 US20040777417 申请日期 2004.02.11
申请人 WANG PETER 发明人 WANG PETER
分类号 G03F7/20;(IPC1-7):G03B27/68 主分类号 G03F7/20
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