发明名称 Substrate processing apparatus, control method for the apparatus, and program for implementing the method
摘要 A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information.
申请公布号 US2005124084(A1) 申请公布日期 2005.06.09
申请号 US20040984982 申请日期 2004.11.10
申请人 TOKYO ELECTRON LIMITED 发明人 SHIMIZU NORIAKI;NUMAKURA MASAHIRO
分类号 H01L21/02;H01L21/00;(IPC1-7):H01L21/66;G01R31/26;C23C16/00 主分类号 H01L21/02
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