Monitor for drying installation for semiconductor wafers, working according to Marangoni principle, with installation containing dipping bath with lifting chamber, to which is coupled supply of mixture of drying substance and carrier gas

摘要

Drying installation for flat workpieces, such as semiconductor wafers (4) contains dipping bath (11), above which is fitted lifting chamber (12) to which is coupled supply (2) of drying substance and carrier gas mixture. To lifting chamber is coupled sensor (81) of drying substance concentration in lifting chamber during drying process. To sensor is connected evaluator (82) determining when drying substance concentration is below rated minimum. Preferably to mixture supply is coupled mixture control unit (26,31), to determine necessity for adjusting mixture supply. Independent claims are included for drying installation and its monitoring.