| 摘要 |
A substrate treating apparatus includes at least two types of treatment units, and a substrate carrying mechanism for carrying a substrate into/out of at least the two types of treatment units. At least the two types of treatment units are selected out of a chemical liquid treatment unit for supplying a chemical liquid to the substrate, a scrubbing unit for scrubbing a surface of the substrate, a polymer removal unit for supplying a polymer removal liquid to the substrate, a peripheral end surface treatment unit for supplying a treatment liquid to an area including the whole of one surface and a peripheral end surface of the substrate, and a gas phase treatment unit for supplying a vapor to the substrate.
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