发明名称 |
Step and repeat imprint lithography systems |
摘要 |
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
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申请公布号 |
US6900881(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20020194414 |
申请日期 |
2002.07.11 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
SREENIVASAN SIDLGATA V.;WATTS MICHAEL P. C.;CHOI BYUNG JIN;MEISSL MARIO J.;SCHUMAKER NORMAN E.;VOISIN RONALD D. |
分类号 |
B29C35/08;B29C59/02;G03F7/00;H01L21/027;(IPC1-7):G03B27/58;G03B27/02;G03B27/20 |
主分类号 |
B29C35/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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