发明名称 Step and repeat imprint lithography systems
摘要 Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
申请公布号 US6900881(B2) 申请公布日期 2005.05.31
申请号 US20020194414 申请日期 2002.07.11
申请人 MOLECULAR IMPRINTS, INC. 发明人 SREENIVASAN SIDLGATA V.;WATTS MICHAEL P. C.;CHOI BYUNG JIN;MEISSL MARIO J.;SCHUMAKER NORMAN E.;VOISIN RONALD D.
分类号 B29C35/08;B29C59/02;G03F7/00;H01L21/027;(IPC1-7):G03B27/58;G03B27/02;G03B27/20 主分类号 B29C35/08
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