| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an arc type evaporation source stably maintaining arc discharge without depending on whether reactive gas or the like are introduced or not, capable of obtaining a layer with a uniform film thickness over a wide range, and provided with a cathode feeding mechanism corresponding to the consumption of a cathode. <P>SOLUTION: The arc evaporation source (20) has: a cathode (22) provided with a through hole (110) along a central axis; and a magnetic field formation mechanism (92) inserted into the through hole (110) and generating a magnetic flux parallel to the central axis of the cathode or spreading to the outer circumferential direction thereof. In the tip part of the magnetic field formation mechanism (92), a protective cap (80) is arranged inside the through hole (110). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
