发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF<SUB>2 </SUB>is also disclosed.
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申请公布号 |
US2005094119(A1) |
申请公布日期 |
2005.05.05 |
申请号 |
US20040927531 |
申请日期 |
2004.08.27 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA ERIK R.;BASELMANS JOHANNES J.M.;DIERICHS MARCEL MATHIJS THEODORE M.;JASPER JOHANNES C.M.;MEIJER HENDRICUS J.M.;MICKAN UWE;MULKENS JOHANNES CATHARINUS H.;LIPSON MATTHEW;UTTERDIJK TAMMO |
分类号 |
H01L21/027;G02B1/10;G03F7/20;(IPC1-7):G03B27/54 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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地址 |
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