EXPOSURE METHOD AND EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus which can compensate with higher accuracy, for non-linear distortions generated in reticle during the exposure. SOLUTION: Locations of all sub-fields and locations of marks for detecting locations formed in the circumference of the sub-field region are measured with a coordinate measuring apparatus (S11), by defining the center of the sub-field region of reticle as the reference location. Locations of the same marks are measured by loading the reticle to the exposure apparatus (S12). Thereafter, displacement data of each mark in the exposure apparatus are calculated from the location data of mark measured in the steps S11 and S12 (S13). Linear deformation of reticle is estimated with the method of least squares (S14). Non-linear displacement of each mark is calculated (S15). Linear displacement of each sub-field is estimated (S16). Non-linear displacement of each sub-field is obtained from a length Rsiof the half-line, extending from the reference location to the original location of the sub-field and the reference location, as a function of the ratio of the line connecting the adjacent marks and the length Rmup to the intersecting point of this half-line (S17). Exposure is conducted by using the location change data of each sub-field (S18), while correcting compensating for the location of sub-field. COPYRIGHT: (C)2005,JPO&NCIPI