发明名称 Exposure system
摘要 An exposure system is provided with an exposure head formed of a red organic EL element which emits light in a red region and another organic EL element which emits light in a predetermined wavelength range shorter than the red region. The exposure system exposes a color photosensitive body containing therein at least a red silver-salt photosensitive material sensitive to the light in the red region and another silver-salt photosensitive material sensitive to the light in the predetermined wavelength range. An optical filter cuts the wavelength components which are shorter than the predetermined wavelength range and included in a sensitive range of the red silver-salt photosensitive material.
申请公布号 US2005078168(A1) 申请公布日期 2005.04.14
申请号 US20040957675 申请日期 2004.10.05
申请人 FUJI PHOTO FILM CO., LTD. 发明人 WADA MITSUGU
分类号 B41J2/44;B41J2/447;B41J2/45;B41J2/455;B41J15/14;B41J27/00;G03B27/16;G03B27/72;H04N1/036;(IPC1-7):B41J15/14 主分类号 B41J2/44
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