| 摘要 |
PROBLEM TO BE SOLVED: To provide a system, an apparatus, and a method for calibrating the reticle stage of a lithographic system. SOLUTION: The method comprises steps of; imaging a reticle through a lithographic system; measuring a set of height offsets based on the imaged reticle; and decomposing the set of measured height offsets in accordance with a plurality of distortional factors. The present invention further comprises steps of: determining the reticle stage deformation attributes based on the distortional factors and the reticle deformation attributes; and then calibrating the reticle stage based on the stage deformation attributes. COPYRIGHT: (C)2005,JPO&NCIPI
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