PLASMA PROCESS CHAMBER,申请号KR20020057228-传众专利搜索

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发明名称	PLASMA PROCESS CHAMBER
摘要
申请公布号	KR100481311(B1)	申请公布日期	2005.04.07
申请号	KR20020057228	申请日期	2002.09.19
申请人		发明人
分类号	H01L21/02;(IPC1-7):H01L21/02	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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