发明名称 Methods and apparatus for bonding substrates
摘要 <p>A substrate bonding method for mutually bonding substrates, has a first radiation step for irradiating the surfaces of the individual substrates with an oxygen particle beam, a second radiation step for irradiating the surfaces of the individual substrate with a nitrogen particle beam simultaneously with or subsequently to the first radiation step, and a step for stacking the individual substrates and bringing the surfaces thereof into close contact. Particularly, the substrates which have been irradiated first with an oxygen plasma and subsequently with a nitrogen plasma are stacked and bonded.</p>
申请公布号 EP1518669(A2) 申请公布日期 2005.03.30
申请号 EP20040019770 申请日期 2004.08.20
申请人 SUGA, TADATOMO;AYUMI INDUSTRY CO., LTD. 发明人 SUGA, TADATOMO;KIM, TAEHYUN;ABE, TOMOYUKI
分类号 B32B37/18;H01L21/02;B32B38/00;H01J37/32;H01L21/18;H01L21/20;H05H1/24;(IPC1-7):B32B31/04;B32B31/00 主分类号 B32B37/18
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