| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition improved in PEB (post exposure baking) temperature dependence and line edge roughness and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The photosensitive composition contains: (A) a compound which generates an aromatic sulfonic acid or an aliphatic sulfonic acid having the alpha site not substituted by a fluorine atom, by irradiation with active rays; and (B) resin which has a monocyclic or polycyclic hydrocarbon structure and at least one kind of repeating unit derived from an acrylate, has 70 to 150°C glass transition temperature and the solubility with an alkaline developing solution increased by the effect of an acid. The method for forming pattern is carried out by using the composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
