| 发明名称 |
POLISHING PLATE, STAGE UNIT, AND EXPOSURE APPARATUS |
| 摘要 |
<p>A polishing plate is disclosed which has a flat supporting surface (3b) and is improved in fracture toughness. The polishing plate can be large-sized easily. A polishing plate (3) having a supporting surface (3b) is composed of a composite material (A) of a main material (a) composed of a ceramic and an auxiliary material (b) composed of a metal.</p> |
| 申请公布号 |
WO2005027206(A1) |
申请公布日期 |
2005.03.24 |
| 申请号 |
WO2004JP13475 |
申请日期 |
2004.09.09 |
| 申请人 |
NIKON CORPORATION;KAYAMA, YASUNAGA |
发明人 |
KAYAMA, YASUNAGA |
| 分类号 |
B24B37/14;B24D3/16;G03F7/20;(IPC1-7):H01L21/027;G12B5/00 |
主分类号 |
B24B37/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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