DEPOSITION OF SILICA COATINGS ON A SUBSTRATE

摘要

A process for the production of a silica coating on a glass substrate provides a precursor mixture of SiH4, NH3, and O2, preferably in the presence of C2H4 and an inert carrier gas. The precursor mixture is directed along a surface of the glass substrate in an atmospheric pressure, on-line, chemical vapor deposition process. The precursor mixture is reacted at the surface of the glass substrate to form a silica coating, essentially devoid of nitrogen, on the glass substrate.